Abstract：ZrW2O8 thin films were deposited on quartz substrates by RF magnetron sputtering with pure ZrW2O8 ceramic target. The microstructure and morphology of the ZrW2O8 thin films were investigated by X-ray diffraction （XRD） and scanning electron microscopy （SEM）. The thickness and cohesion of the films were measured by surface profilometer and scratching adhesion tester respectively. The results indicated that as-deposited ZrW2O8 film shows an amorphous phase and its surface is smooth and compact. The trigonal ZrW2O8 film can be prepared at the annealing temperature of 740℃ for three minutes; the cubic ZrW2O8 film can be prepared in a sealed cell at 1 200℃ for eight minutes after cooling in water. With the increase of annealing temperature, the grain size grew bigger. Meanwhile, some holes and deficiencies appeared in the surface of the films, and the cohesion between the film and the substate decreased gradually.
2008, Vol. 29 
