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| Design of thin film resistivity measurement system based on virtual instrumentation technology |
| 1. School of Mechanical Engineering, Jiangsu University, Zhenjirmg, Jiangsu 212013, China; 2. Center of Micrn-Nano Science and Technology, Jiangsu University, Zhenjiang, Jiangsu 212013, China; 3. Center of Low-dimensional Materials, Micro-Nano Devices and System, Jiangsu Polytechnic University, Changzhou, Jiangsu 213164, China） |
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Abstract Thin film resistivity measurement system was designed based on the virtual instrumentation technology and Rymaszewski dual electro-measurement with four-point probes. Interface circuit based on CD4052 chip was designed to realize automatic switching of current probes and voltage probes under the control of virtual instrumentation software, LabVIEW and digital output module hardware, NI 9401. Keithley 2400 sourcemeter under control of LabVIEW program was used for two times voltage measurement, and then van der Pauw correction factor and sheet resistance were calculated by LabVIEW program based on results of voltage measurement. Finally, thin film resistivity was automatically measured, recorded and displayed. The results of experiments show that the proposed system can meet the needs of thin film resistivity automatic measurement, the measurement process for thin film resistivity can be simplified and the level of measurement accuracy and automation can be improved.
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2010, Vol. 31 
