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| Effect of sputtering parameters on texture of Cu films |
1. School of Mechanical Engineering, Jiangsu University, Zhenjiang, Jiangsu 212013, China; 2. Guangdong Nonferrous Metals Geological Exploration Bureau, Guangzhou, Guangdong 510080, China）
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Abstract Cu films were deposited on glass substrates by D. C. magnetron sputtering using Cu target with purity of more than 99.9% in Ar atmosphere by changing sputtering power and temperature of the glass substrates. The structures, surface composition of the films and the effect of sputtering parameters on the films texture were analyzed by X - ray diffraction （XRD） and scanning electron microscopy （SEM）. The results indicate that the film with smooth and dense structure and minute grains can be obtained if the sputtering pressure is 0.5 Pa, the sputtering power is 40 W and the temperature of the glass substrates are 423 K and 473 K.
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2009, Vol. 30 
